by Annie Laver | Apr 9, 2026 | Blog
Meet the Experts: Professor Erwin Kessels Erwin Kessels is a professor at Eindhoven University of Technology and has been active in (plasma-enhanced) ALD since 2002. His research has since expanded to ALE and area-selective ALD. He has received several awards,...
by Annie Laver | Mar 25, 2026 | Blog
The semiconductor industry is currently undergoing a significant shift. As we move into the sub-3nm process node (where features are measured by counting individual atoms), the manufacturing methods of the last decade are reaching their physical limits. At this scale,...
by Annie Laver | Jan 28, 2026 | Blog
In the race to sub-3nm nodes, precision isn’t just an advantage- it’s a requirement. As semiconductor features shrink, traditional continuous plasma etching is hitting its physical limits. The industry’s solution? Pulsed Capacitively Coupled Plasmas...
by Annie Laver | Dec 19, 2025 | Blog
In plasma processing, perfection is fragile. One small, unpredictable change in gas pressure or power can undo an otherwise optimised process. To move beyond trial-and-error, engineers and researchers rely on simulation. Choosing the Quantemol Virtual Tool (QVT) means...
by Annie Laver | Nov 28, 2025 | Blog
PRESS RELEASE The partnership combines advanced plasma modelling with cutting-edge experimentation to enable faster and more precise plasma processing using tailored waveform biasing. LONDON and BRISTOL, UK – 28/11/2025 – Quantemol Ltd, a leader in plasma...
by Annie Laver | Nov 20, 2025 | Blog
Mastery of the fourth state of matter, plasma, is a delicate and powerful balancing act, where even a slight change in gas pressure or power can ruin your entire process. Traditional plasma R&D grinds progress to a halt, burning time and budget on...
