In the race to sub-3nm nodes, precision isn’t just an advantage- it’s a requirement. As semiconductor features shrink, traditional continuous plasma etching is hitting its physical limits. The industry’s solution? Pulsed Capacitively Coupled Plasmas (CCPs).
Why is the industry moving to Pulsing?
Standard “continuous wave” plasmas can lead to charge buildup and surface damage in deep trenches. By rapidly switching the Radio Frequency (RF) power on and off, often across multiple frequencies, manufacturers gain a new level of control:
- Neutralising Charge: The “off” phase (afterglow) allows the plasma sheath to collapse. This enables accumulated charges in the etched trench to neutralise, preventing effects such as notching.
- Chemical Tuning: Pulsing acts as a “chemical knob.” During the off-period, short-lived ions decay faster than long-lived neutral radicals. By adjusting the duty cycle, researchers can fine-tune the neutral-to-ion flux ratio, optimising selectivity for complex 3D structures.
- Thermal Management: The periodic “off” state prevents cumulative heat buildup. This protects sensitive materials from “wiggling” or degradation, allowing for higher peak powers without damaging the wafer.
Making Simulation Simple: The New QVT Update
At Quantemol, we know that simulating these complex environments shouldn’t be as difficult as the physics behind them. Previously, setting up pulsed CCPs in the Quantemol Virtual Tool (QVT) was a high-touch process involving bespoke HPEM binaries and the manual editing of raw input files.
In our upcoming release, we’ve removed these barriers:
- Standardised Power: Pulsed CCP functionality is now built into the default HPEM binary. No special versions required.
- GUI Integration: You can now set up pulsing parameters (frequencies, duty cycles) directly through our intuitive Graphical User Interface.
- Faster R&D: By moving away from “raw file” editing, your team can iterate on pulsing strategies in minutes, not hours.
This update brings the most advanced etch control techniques to your desktop, making high-fidelity plasma modelling more accessible than ever.
Would you like a sneak peek at the new GUI or a technical breakdown of the pulse settings? Join our upcoming masterclass on February 17th → Register here
By Annie Laver
Annie Laver
SCIENTIFIC COMMUNICATIONS ADMINISTRATOR