Access Our White Paper: “Tailored Waveform Biasing: Impact on Advanced Semiconductor Processing.”
The future of smaller, faster electronic devices depends on the precision of processes like Atomic Layer Etching (ALE) and Atomic Layer Deposition (ALD). Traditional methods for controlling ion energy are failing to meet these demands, resulting in either damaging wafer charging or complex, non-uniform ion bombardment. This white paper reveals how Tailored Waveform Biasing (TWB) delivers the precise, monoenergetic ion control critical for next-generation device fabrication, all while effectively preventing wafer charge accumulation.
In this paper you will gain critical insights into:
- Overcoming Traditional Limitations: Learn why conventional DC voltage and sinusoidal waveforms fail to meet the stringent requirements of modern semiconductor processing.
- The Power of Waveform Design: Understand the specific structure of TWB, including the critical negative voltage slope, that achieves nearly monoenergetic ion distribution while simultaneously discharging the wafer surface.
- Real-World Modelling: See how Quantemol’s Q-VT software incorporates TWB concepts, providing actionable data on how factors like chamber geometry and voltage ramp rate directly influence ion energy and bulk plasma position.
- A Blueprint for Success: Discover how you can use first-principles simulation to validate and optimise your plasma process ideas before expensive prototype builds.
Access Our White Paper: “Tailored Waveform Biasing: Impact on Advanced Semiconductor Processing.”
The future of smaller, faster electronic devices depends on the precision of processes like Atomic Layer Etching (ALE) and Atomic Layer Deposition (ALD). Traditional methods for controlling ion energy are failing to meet these demands, resulting in either damaging wafer charging or complex, non-uniform ion bombardment. This white paper reveals how Tailored Waveform Biasing (TWB) delivers the precise, monoenergetic ion control critical for next-generation device fabrication, all while effectively preventing wafer charge accumulation.
In this paper you will gain critical insights into:
- Overcoming Traditional Limitations: Learn why conventional DC voltage and sinusoidal waveforms fail to meet the stringent requirements of modern semiconductor processing.
- The Power of Waveform Design: Understand the specific structure of TWB, including the critical negative voltage slope, that achieves nearly monoenergetic ion distribution while simultaneously discharging the wafer surface.
- Real-World Modelling: See how Quantemol’s Q-VT software incorporates TWB concepts, providing actionable data on how factors like chamber geometry and voltage ramp rate directly influence ion energy and bulk plasma position.
- A Blueprint for Success: Discover how you can use first-principles simulation to validate and optimise your plasma process ideas before expensive prototype builds.