Electron-molecule collision processes lead to both chemical and physical changes of matter in environments associated with radiation chemistry, stability of waste repositories, plasma-enhanced chemical vapour deposition (CVD), the lighting industry and plasma processing of materials for microelectronics.

In industry, CO₂ lasers require electron impact excitation of vibrational and rotational states of the CO₂and N₂ to lase (Demaria 1979; hence an accurate knowledge of the relevant cross-sections is necessary for modelling and optimisation of the laser system.

In material science, electron scattering is used to probe the structure of materials such as molecular crystals (Dorset 1996).

The molecules used to etch semiconductor materials do not react with silicon surfaces unless they are subjected to electronic collisions to produce highly reactive radicals and ions in the low-temperature plasmas used in plasma etching and in plasma-enhanced chemical vapour deposition.

Electrons in radioactive and chemical waste are responsible for much of the chemistry that determines how these chemicals age and change.

Electron collisions create the reactive molecular fragments in the plasma devices which are used to destroy undesirable compounds or remediate NO_x in combustion exhaust.